Reduced Substrate Interference
Suitable for XRD measurements involving weak peaks, limited sample quantities, or broad amorphous backgrounds.
Product Description
Designed to Reduce Silicon-Substrate Peak Interference
SciMater™ XRD no-diffraction-peak silicon substrates are primarily used to support powder, particle, thin-film, slurry, and trace-quantity material samples. Through a selected crystal orientation, cutting angle, or measurement geometry, strong diffraction signals from the silicon substrate are shifted away from the target scan region, helping reduce substrate-peak interference in the analysis of weak sample peaks, amorphous humps, and low-content phases.
Important clarification: “No diffraction peak” means that visible silicon-substrate peak interference is minimized within the corresponding scan range under compatible test conditions. It does not mean that diffraction signals will be absent under every X-ray wavelength, incident angle, sample stage, scan mode, or instrument geometry. Before formal testing, confirm the X-ray target, scan mode, incident angle, sample orientation, and instrument geometry.
Three Scan-Range Options
Available in 2°–75°, 2°–90°, and 2°–120° versions for different angular coverage requirements.
Square and Round Formats
Square sizes from 10 mm × 10 mm to 20 mm × 20 mm and round sizes from Φ15 mm to Φ32 mm.
Suitable for Trace Samples
Helps reduce the background contribution of conventional sample holders for powders, particles, and thin films.
Scan Range Categories
Choose the Angular Range for Your Measurement
Routine Phase Identification
Suitable for most routine phase analysis of powders, particles, and thin films. Current listed sizes are designated as clearance specifications.
Higher-Angle Information
Suitable for conventional phase analysis and structural studies that require diffraction information at higher angles.
Broad Angular Coverage
Suitable for measurements requiring a wider scan interval, high-angle peaks, or more detailed structural information.
Complete Product Comparison
Scan Range, Shape, Thickness, and Finished Size
All currently provided scan ranges, shapes, thicknesses, and finished sizes are listed in one table. Prices are not included.
| XRD Scan Range | Product Shape | Nominal Thickness | Finished Size | Size Format | Product Status | Recommended Use |
|---|---|---|---|---|---|---|
| 2°–75° No-Diffraction-Peak | Square Silicon Substrate | 1 mm | 10 mm × 10 mm | Small Square | Clearance | Trace powders, particles, and thin-film samples |
| 2°–75° No-Diffraction-Peak | Square Silicon Substrate | 1 mm | 20 mm × 20 mm | Large Square | Clearance | Larger-area samples and powder spreading |
| 2°–75° No-Diffraction-Peak | Square Silicon Substrate | 2 mm | 10 mm × 10 mm | Thick Small Square | Clearance | Trace samples and stable clamping |
| 2°–75° No-Diffraction-Peak | Square Silicon Substrate | 2 mm | 20 mm × 20 mm | Thick Large Square | Clearance | Larger sample area and stable support |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ15 mm | Small-Diameter Round | Clearance | Round sample stages and trace samples |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ25 mm | Medium-Diameter Round | Clearance | Standard round sample holders and powder testing |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ32 mm | Large-Diameter Round | Clearance | Larger sample stages and broad-area spreading |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ15 mm | Thick Small Round | Clearance | Trace samples and stable clamping |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ25 mm | Thick Medium Round | Clearance | Routine powder and particle samples |
| 2°–75° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ32 mm | Thick Large Round | Clearance | Large-area support and wide sample holders |
| 2°–90° No-Diffraction-Peak | Square Silicon Substrate | 2 mm | 10 mm × 10 mm | Small Square | Standard | Trace samples and extended-angle scans |
| 2°–90° No-Diffraction-Peak | Square Silicon Substrate | 2 mm | 15 mm × 15 mm | Medium Square | Standard | Routine powder, particle, and thin-film testing |
| 2°–90° No-Diffraction-Peak | Square Silicon Substrate | 2 mm | 20 mm × 20 mm | Large Square | Standard | Larger-area powder spreading and thin films |
| 2°–90° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ15 mm | Small-Diameter Round | Standard | Round sample stages and trace samples |
| 2°–90° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ25 mm | Medium-Diameter Round | Standard | Routine testing with round sample holders |
| 2°–90° No-Diffraction-Peak | Round Silicon Substrate | 2 mm | Φ32 mm | Large-Diameter Round | Standard | Large-area samples and extended-angle scans |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1 mm | 10 mm × 10 mm | Thin Small Square | Wide-Angle | Trace samples and wide-angle scans |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1 mm | 15 mm × 15 mm | Thin Medium Square | Wide-Angle | Powder, thin-film, and particle testing |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1 mm | 20 mm × 20 mm | Thin Large Square | Wide-Angle | Large-area thin films and powder spreading |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1.8 mm | 10 mm × 10 mm | Thick Small Square | Wide-Angle | Trace samples and stable clamping |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1.8 mm | 15 mm × 15 mm | Thick Medium Square | Wide-Angle | Routine samples and high-angle peak testing |
| 2°–120° No-Diffraction-Peak | Square Silicon Substrate | 1.8 mm | 20 mm × 20 mm | Thick Large Square | Wide-Angle | Large-area samples and stable support |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ15 mm | Thin Small Round | Wide-Angle | Round sample stages and trace samples |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ25 mm | Thin Medium Round | Wide-Angle | Routine powder and thin-film samples |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1 mm | Φ32 mm | Thin Large Round | Wide-Angle | Large-area samples and wide-angle scans |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1.8 mm | Φ15 mm | Thick Small Round | Wide-Angle | Trace samples and stable testing |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1.8 mm | Φ25 mm | Thick Medium Round | Wide-Angle | Routine phase analysis and high-angle peaks |
| 2°–120° No-Diffraction-Peak | Round Silicon Substrate | 1.8 mm | Φ32 mm | Thick Large Round | Wide-Angle | Larger samples and stable support |
The table lists only the currently provided product sizes and scan ranges. Thickness tolerance, dimensional tolerance, surface condition, crystal-orientation marking, packaging method, and compatible test conditions are subject to final order confirmation.
Primary Applications
Research and Testing Scenarios
Powder Phase Analysis
For XRD testing of inorganic powders, ceramic powders, metal powders, and mineral samples.
Trace-Quantity Samples
For research samples that are too limited to fill a conventional sample holder.
Thin Films and Coatings
For supporting or directly preparing thin films, coatings, and surface-deposited materials.
Two-Dimensional Materials
For graphene, MXene, transition-metal chalcogenides, and layered-material research.
Catalyst Materials
For catalyst powders, supported catalysts, and phase-change analysis before and after reaction.
Battery Materials
For cathodes, anodes, solid electrolytes, and coated electrode materials.
Amorphous and Poorly Crystalline Materials
Helps reduce strong substrate-peak interference with broad humps, weak peaks, and low-crystallinity signals.
In-Situ or Special Sample Stages
Square or round formats can be selected according to fixture dimensions and dedicated sample-stage designs.
University Research and Teaching
For teaching experiments involving sample preparation, background comparison, trace samples, and phase analysis.
Product Selection Guide
How to Select the Appropriate Specification
Routine Powder ScansChoose the 2°–75° version for common phase identification and routine XRD testing.
High-Angle Peak InformationChoose the 2°–90° or 2°–120° version when a wider angular range is required.
Trace Powder SamplesChoose a 10 mm × 10 mm square or Φ15 mm round substrate to reduce the required spreading area.
Large-Area Thin FilmsChoose a 20 mm × 20 mm square or Φ32 mm round substrate to increase the effective test area.
Round Sample StagesSelect Φ15 mm, Φ25 mm, or Φ32 mm according to the inner diameter of the sample holder.
More Stable ClampingChoose 1.8 mm or 2 mm thickness and confirm the permitted sample-stage height and fixing method.
Low-Angle MeasurementsIn addition to scan range, confirm grazing-incidence mode, incident angle, sample flatness, and sample height.
Detailed Structural AnalysisConfirm that the X-ray target, optical path, step size, and instrument geometry match the product specification.
Instructions for Use
Recommended Preparation and Testing Procedure
1
Confirm the Scan Range
Select 2°–75°, 2°–90°, or 2°–120° according to the required upper scan limit.
2
Check Sample-Stage Dimensions
Confirm that the square or round substrate fits securely into the XRD sample holder or dedicated fixture.
3
Clean the Surface
Use clean nitrogen gas to remove particles. Avoid wiping the surface directly with rough materials.
4
Place the Sample
Spread powders evenly. Secure thin films or particles within the effective measurement area.
5
Control Sample Height
Keep the sample surface aligned with the instrument reference plane to reduce peak-position shifts.
6
Confirm Orientation
Follow the label or batch instructions and avoid changing the substrate orientation arbitrarily.
7
Run a Blank Scan
Before first use, scan a blank substrate to confirm the background under the current instrument conditions.
8
Clean and Store
Remove sample residues after testing and store each substrate separately in a clean wafer box.
Use and Storage Precautions
Important Handling Notes
Avoid Incorrect OrientationChanging the crystal orientation may alter diffraction conditions. Follow the product label or test instructions.
Avoid Excessive Sample ThicknessAn overly thick or uneven sample layer may cause peak-position shifts and intensity changes.
Prevent Surface ContaminationOil, adhesive, and residual powder may introduce additional background or unwanted peaks.
Use Binders CarefullyTape, grease, and organic adhesive may create amorphous background. Run a blank test first.
Avoid Edge ImpactSilicon is hard and brittle. Hold the substrate by its edges and avoid drops or collisions.
Store Separately and CleanlyMark different scan ranges and sizes separately to prevent mix-ups, contamination, and scratches.
Frequently Asked Questions
FAQ
1. What is an XRD no-diffraction-peak silicon substrate?
It is a silicon-based substrate designed with a selected crystal orientation or cutting geometry. Within the corresponding scan range and compatible test conditions, it can reduce interference from characteristic silicon-substrate peaks in the sample signal.
2. Does “no diffraction peak” mean that no silicon peak will appear under any condition?
No. Diffraction results depend on X-ray wavelength, instrument geometry, scan mode, incident angle, sample stage, and substrate orientation. Performance should be evaluated according to the specified scan range and compatible measurement conditions.
3. How should I choose between 2°–75°, 2°–90°, and 2°–120°?
Choose according to the required final scan angle. The 2°–75° version is suitable for routine phase analysis, while the 2°–90° and 2°–120° versions are recommended when higher-angle diffraction information is required.
4. What is the difference between square and round substrates?
Square substrates are suitable for general flat sample stages and thin-film preparation. Round substrates are more suitable for round sample holders, rotating sample stages, and fixtures with a specified inner diameter.
5. Can powder be placed directly on the substrate?
Yes. Spread the powder uniformly within the effective area and control the sample-layer thickness and flatness. For limited sample quantities, a smaller substrate is recommended.
6. Is the product suitable for thin-film and coating measurements?
Yes. Materials may be deposited directly on the substrate, or a thin-film sample may be fixed to the surface. The influence of substrate crystal orientation on the selected measurement mode should still be evaluated.
7. Why is a blank scan recommended before first use?
A blank scan confirms the substrate background under the current instrument, X-ray target, optical path, and placement orientation, providing a reference for comparison with the actual sample result.
8. Can tape or adhesive be used to secure a sample?
Yes, but tape and adhesive may introduce amorphous background or unwanted peaks. Test the fixing material separately and keep it outside the X-ray irradiation area whenever possible.
9. Can the silicon substrate be reused?
It can be reused when the surface is not scratched, corroded, or contaminated and the sample residue can be completely removed. For high-precision measurements, use clean substrates with consistent surface condition.
10. What information should be confirmed before ordering?
Confirm the scan range, shape, finished size, thickness, X-ray target, scan mode, sample-stage dimensions, quantity, packaging method, and whether batch-specific test information is required.
Before Ordering
Recommended Inquiry Format
Please provide the following information to improve specification matching and order confirmation:
XRD Scan Range + Square/Round + Finished Size + Thickness + X-ray Target + Scan Mode + Sample-Stage Size + Quantity + Packaging Requirement
Example: 2°–120° no-diffraction-peak + round + Φ25 mm + 1 mm thickness + Cu target + conventional θ–2θ scan + 10 pieces + individual wafer-box packaging.
Product Summary
SciMater™ XRD No-Diffraction-Peak Silicon Substrates
SciMater™ XRD no-diffraction-peak silicon substrates are available in 2°–75°, 2°–90°, and 2°–120° scan-range versions. Square sizes range from 10 mm × 10 mm to 20 mm × 20 mm, while round sizes range from Φ15 mm to Φ32 mm. They are suitable for powder, thin-film, two-dimensional material, battery-material, catalyst, and trace-sample testing. Product selection should be based on the final scan angle, sample-stage structure, sample area, and clamping method. A blank scan is recommended before first use.
Product specifications and compatible measurement conditions are subject to final order confirmation, product labeling, and batch-specific documentation.
